Nickel-Vanadium (NiV) Target
Contributing to the manufacturing of integrated circuits (ICs) and the semiconductor and microelectronics industry! Nickel-vanadium materials capable of depositing high-quality thin films.
■ Purity: 99.5% ~ 99.9% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.
- Company：SPUTTERCORE CO.,LTD.
- Price：Other
