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Contributing to the manufacturing of integrated circuits (ICs) and the semiconductor and microelectronics industry! Nickel-vanadium materials capable of depositing high-quality thin films.
■ Purity: 99.5% ~ 99.9% ■ Density (8.4 g/cm³) ■ Manufacturing method: Vacuum melting method *For more details, please download the PDF or feel free to contact us.
Vanadium oxide materials available for use in the RF sputtering process essential for the manufacturing of microelectronics components!
■ Purity > 99.9% ■ Density (4.26 g/cm³) ■ Applications Used in the RF sputtering process, which is essential for the manufacturing of microelectronics components. Utilized for thin film deposition in high-definition displays and optical devices, and in fields requiring excellent material quality such as optical coatings and sensor technology. Also used as an oxidation catalyst for sulfur dioxide in the sulfuric acid manufacturing process and as a catalyst for the production of other organic acids. Employed to improve the performance and efficiency of solar cells. *For more details, please download the PDF or feel free to contact us.*
